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INNOVATIVE PLASMA SOLUTIONS

A WORLDWIDE COMPANY
AcXys Technologies UK & USA
ULD film treatment
Wide inline activation
ULS profile activation
Fast & efficient adhesion improvement
ULD foam treatment
Cold activation of sensitive materials
ULS-3 composite processing
Using 3 nozzles to cover larger surfaces

Events

EPHJ-EPMT-SMT
June 02-05, 2015
Geneva, Switzerland
www.ephj.ch/

Chinaplas 2015
May 20-23, 2015
Guangzhou, China
www.chinaplasonline.com

SAMPE Baltimore
May 19-20, 2015
Baltimore, USA
Innolab - Booth L21
www.sampebaltimore.org/

News

PlasmaFilmPP

Thin cleaning of metals
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New ULC Injection module for thin film coating

SiOxWafers

New ULC Injection module for thin film coating
Read more ...

PlasmaFilmPP

Atmospheric Plasma to process high added value films
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Thin film deposition

CVD coatings (Chemical Vapor Deposition) are performed with Atmospheric Pressure Plasma. Vapors of a suitable metal organic precursor are injected into the plasma. Uniform and homogeneous thin films can even be deposited on polymers.

Film deposition is a recent development topic and many applications for this technology are under investigation. Coatings give advanced functionalities to materials and are easily customized to customer specifications. For example, a glass film adds anti-abrasion property to a plastic part, anti-attrition property to metals or a new optical functionalities to glass.

Process engineers at the Process Development Laboratory of AcXys Technologies are currently studying these processes. Their support is a valuable resource for companies who wish to benefit from these advanced processes.


SiO2 deposition on silicon wafer