Thin film deposition
CVD coatings (Chemical Vapor Deposition) are performed with Atmospheric Pressure Plasma. Vapors of a suitable metal organic precursor are injected into the plasma. Uniform and homogeneous thin films can even be deposited on polymers.
Film deposition is a recent development topic and many applications for this technology are under investigation. Coatings give advanced functionalities to materials and are easily customized to customer specifications. For example, a glass film adds anti-abrasion property to a plastic part, anti-attrition property to metals or a new optical functionalities to glass.
Process engineers at the Process Development Laboratory of AcXys Technologies are currently studying these processes. Their support is a valuable resource for companies who wish to benefit from these advanced processes.
SiO2 deposition on silicon wafer