[et_pb_section fb_built=\u00a0\u00bb1″ module_class=\u00a0\u00bblddw-entete-responsive\u00a0\u00bb _builder_version=\u00a0\u00bb4.9.2″ background_image=\u00a0\u00bbhttps:\/\/www.acxys.com\/wp-content\/uploads\/2021\/03\/P10301403-2-scaled.jpg\u00a0\u00bb background_position=\u00a0\u00bbbottom_center\u00a0\u00bb custom_padding=\u00a0\u00bb1%||1%|\u00a0\u00bb z_index_tablet=\u00a0\u00bb500″][\/et_pb_section][et_pb_section fb_built=\u00a0\u00bb1″ _builder_version=\u00a0\u00bb3.22″ custom_padding=\u00a0\u00bb0px||\u00a0\u00bb][et_pb_row _builder_version=\u00a0\u00bb3.26.7″ animation_style=\u00a0\u00bbslide\u00a0\u00bb][et_pb_column type=\u00a0\u00bb4_4″ _builder_version=\u00a0\u00bb3.25″ custom_padding=\u00a0\u00bb|||\u00a0\u00bb custom_padding__hover=\u00a0\u00bb|||\u00a0\u00bb][et_pb_text module_class=\u00a0\u00bblddw-landing-conteneur blue\u00a0\u00bb _builder_version=\u00a0\u00bb3.27.4″ text_font=\u00a0\u00bb||||||||\u00a0\u00bb header_font=\u00a0\u00bb|600||on|||||\u00a0\u00bb header_text_color=\u00a0\u00bb#ffffff\u00a0\u00bb header_font_size=\u00a0\u00bb20px\u00a0\u00bb z_index_tablet=\u00a0\u00bb500″]<\/p>\n
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L\u2019aptitude des technologies plasma \u00e0 d\u00e9poser des couches minces de mat\u00e9riaux \u00e0 basse temp\u00e9rature sur tout type de surface offre des perspectives d\u2019application tr\u00e8s int\u00e9ressantes pour l\u2019ensemble de l\u2019industrie. Ces couches minces peuvent servir de couches interfaciales ou de couches d\u2019accroche voire devenir des couches \u00ab fonctionnelles \u00bb, c\u2019est-\u00e0-dire apportant des fonctionnalit\u00e9s telles que l\u2019hydrophilie, l\u2019hydrophobie ou participer \u00e0 la protection des surfaces.
A la diff\u00e9rence de l\u2019activation de surface qui laisse presque inchang\u00e9e la nature chimique de la surface trait\u00e9e, l\u2019action de d\u00e9poser un mat\u00e9riau en couche mince sur une surface transforme totalement la nature chimique de celle-ci. <\/p>\n
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Le d\u00e9p\u00f4t de couches minces de mat\u00e9riau par plasma r\u00e9sulte d\u2019une s\u00e9quence chimique mettant en \u0153uvre des r\u00e9actifs gazeux et des r\u00e9actifs sous forme vapeur pour les atomes constitutifs du mat\u00e9riau non disponibles sous forme gazeuse. En science des mat\u00e9riaux, cette s\u00e9quence est d\u00e9sign\u00e9e par le terme de d\u00e9p\u00f4t en phase vapeur ou d\u00e9p\u00f4t CVD (Chemical Vapor Deposition).
Comme pour toute r\u00e9action chimique, un moyen de chauffage externe, faisant s\u2019\u00e9lever significativement la temp\u00e9rature de surface, est souvent un facteur n\u00e9cessaire pour d\u00e9bloquer la cin\u00e9tique de la r\u00e9action. Mais l\u2019assistance d\u2019un plasma, ionisant les gaz participants \u00e0 la r\u00e9action permet de s\u2019affranchir de ce besoin thermique et il devient m\u00eame possible de mener des r\u00e9actions CVD sans moyen de chauffage externe.<\/p>\n
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Mat\u00e9riau \u00e0 multiples usages, la silice se d\u00e9pose \u00e0 partir de plusieurs pr\u00e9curseurs chimiques peu on\u00e9reux et avec des vitesses de d\u00e9p\u00f4t tout-\u00e0-fait compatibles avec les cadences industrielles.<\/p>\n
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Des preuves de concept ont \u00e9t\u00e9 faites pour d\u2019autres mat\u00e9riaux.<\/p>\n
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Parce que les d\u00e9p\u00f4ts de couches mince par plasma ne mettent en \u0153uvre que de tr\u00e8s faible quantit\u00e9 de produits chimiques liquides, ils se caract\u00e9risent par une plus grande acceptabilit\u00e9 environnementale.<\/p>\n
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