AcXys Technologies developed ULCoat : thin layers deposit made easy – countless applications


ULCoat uses the injection of a precursor into plasma at post-discharge phase to deposit thin layers onto the target surface.

ULCoat specifics feature a spray system that requires the injection of a precursor under the plasma nozzle. ULCoat device must be coupled to ULS OMEGA.
The standard unit has been designed to deposit SiOx with a metal-organic precursor. However, other recipes can be developed upon request.
At AcXys Technologies, we can accommodate your specific requests: team up with our Lab to develop your custom solutions – this is what R&D contracts are made for.

ULCoat is available as a standalone equipment or as OEM.

ULCoat technology

  • – Coupled to ULS OMEGA module
  • – Used for thin layers depositing
  • – Adjustable thickness from 50 to 1000 nanometers
  • – Even thickness with +/- 2% variation
  • – Processing speed for treatment up to 200 nm.cm2 / s
  • – Standard version is optimum for SiOx deposits

Injection nozzle

Precursor flow is monitored prior its injection into plasma. This module integrates the following elements:

  • – Precursor tank
  • – Precursor flow control
  • – Gas flow control
  • – Heating component (optional)

Intuitive digital interface touchscreen

  • – Embedded touchscreen (remote if OEM)
  • – Intuitive controlling
  • – Multilingual interface
  • – Error detection and troubleshooting
  • – Real time display of instructions

Compatible gas

  • – Air
  • – Nitrogen
  • – Other gas blend

Benefits of ULCoat

  • – Low temperature
  • – Even thickness with 2% variation
  • – Other deposits can possibly be integrated
  • – OpenFlow version available for the development of new depositing processes