It is used for thin film coatings. Atmospheric plasma is a source of chemically reactive species. Injecting a precursor into a plasma leads to the creation of a surface coating.
- SiO2 thin film coating
- Other materials can be coated
- Thickness: 50 to 1000 nm
- Optimized thickness uniformity +/- 2%
- Typicall coating speed : 200 nm.cm2/s
- Easy to use
- Needs to be operated with a ULS module
UL-COAT module creates a thin film coating, by injecting a precursor into a plasma. The standard module is designed for non-stoechiometric silicon oxide (SiOx) coatings, using an organo-metallic precursor. Other coating compositions can be studied on request. Our R&D laboratory offers R&D outsourcing contracts and can customize your application under a development contract.
The coating device is designed for the ULS technology. It uses a special nozzle adaptor for injecting the precursor into the ULS plasma.
The liquid precursor flow is controlled before the injection into the plasma. The module has several components :
- Precursor tank
- Flow controller
- Carrier gas controller